PSD-UV
The PSD-UV was designed for applications in the electronic, semiconductor and scientific industries. A mercury vapor lamp generates ultra-violet light and ozone resulting in the atomic cleaning of silicon, silicon nitride, glass and other materials. The PSD-UV can also be used for UV curing, UV patterning, sharpening AFM probes and ozone etching.
Features
 | The PSD-UV removes organic contaminates |
| UV lamp generates UV light at both 185nm and 254nm |
| Produces O3 and provides molecular excitation |
| Operates at atmospheric pressure with ambient air or oxygen |
| Multiple gas ports for the introduction of gases |
| Adjustable sample to lamp distance |
| Safety switched to prevent user exposure to UV light |
| Simple operation and compact footprint First rate technical support and customer service |
PSD-UVOP Flow-Through Ozone Generator
The PSD-UVOP Ozone Generator produces high levels of ozone with the introduction of pure O2 into the pump chamber. The PSD-UVOP has been designed for use with the PSD series of UV/Ozone cleaning systems available from technologies, or with other instruments benefiting from high levels of ozone for general function or cleaning applications.
Features
| Produces >100ppm O3 when operated with O2 |
| Operates at atmospheric pressure |
| Simple operation and compact footprint |
| First rate technical support and customer service |
Common UV/Ozone Applications
| AFM Probe Cleaning / Tip Sharpening |
| Semiconductor Surface Oxidation and Preparation |
| Cleaning Lenses and Optics |
| Improvement of Surface Wettability |
| Cleaning Quartz and Ceramic Surfaces |
| Preparation for Thin Film Deposition |
| Ultraviolet Curing |
| Surface Patterning |
| Ozone Etching |
Suitable Substrate Materials
| Silicon |
| Gallium Arsenide |
| Glass Quartz |
| Mica |
| Sapphire |
| Metals |
| Ceramics |
| Polymers |
| Resists |
| Please inquire about other materials |